International Journal of Computer
& Organization Trends

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Volume 5 | Issue 2 | Year 2015 | Article Id. IJCOT-V19P311 | DOI : https://doi.org/10.14445/22492593/IJCOT-V19P311

Photocatalysis in Carbon doped TiO2 thin films grown by DC magnetron sputtering

A. Karuppasamy

Citation :

A. Karuppasamy, "Photocatalysis in Carbon doped TiO2 thin films grown by DC magnetron sputtering," International Journal of Computer & Organization Trends (IJCOT), vol. 5, no. 2, pp. 82-84, 2015. Crossref, https://doi.org/10.14445/22492593/IJCOT-V19P311

Abstract

Pure and carbon doped TiO2 thin films were grown by reactive pulsed dc magnetron sputtering of titaniumin argon, oxygen and carbondioxide atmosphere. Sputtering density, argon and oxygen flow rates were maintained at 5W/cm2, 10 sccm and 6sccm, respectively whereas the carbondioxide flow rate was varied. The thin films were investigated for their structural, optical, morphological and photocatalytic properties. Carbon doped TiO2 thin films show a near visible bandedge (390 nm) and higher photocatalytic efficiency; degradation rate of methylene blue is 0.799 ?mol/l.d.

Keywords

Photocatalysis, Sputtering, Thin films, and Oxides.

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